Nanoimprint Lithography

Capabilities

• Flexible and cost efficient lithography
• Nanopattern replication of surfaces down to 10 nm for surface functionalization
• Thermal or UV NIL with controlled wetting
• Hot embossing
• Simultaneous Thermal and UV (STU®) imprint process
• Uses the patented Soft Press® technology
• Uniform heating and a wide range of temperature settings
• Use of wide range of imprint polymer